Clean-room Process

보유공정 소개 Introduction for ADRC process

경희대학교 차세대 디스플레이 연구센터(ADRC)는

디스플레이 연구분야에 있어서 세계를 선도하고 있습니다.

  총 50개의 공정이 등록되어 있습니다. 검색하실 공정명이나 사양을 입력하시고 검색을 클릭하세요.
  • image
a-Si:H deposition
PECVD System
(Plasma-enhanced chemical vapor deposition)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max 200 nm/Time
  • image
SiNx, SiO₂ deposition
PECVD System
(Plasma-enhanced chemical vapor deposition)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max 200 nm/Time
  • image
PIN deposition
PECVD System
(Plasma-enhanced chemical vapor deposition)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max 700 nm/Time
  • image
Cu, Ti, Mo, Al, IZO, ITO deposition
DC sputtering system

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max. 200 nm/Time
  • image
Au deposition
[Au sputter]
Company : SAM WON Vacuum
Substrate size : < 15cm X 15cm
Target : 6-inch
Vacuum gauge : 10-5 Torr
Thickness : Max. 100 nm/time
  • image
Ion Shower Doping System
p- or n-doping for amorphous and crystal silicon
 
P-doping (B2H6), N-doping (PH3)
 
Model. No. : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS
 
Substrate size : < 15cm X 15cm
  • image
Photo-lithography
Size
1. Mask : 8-inch
2. Substrate : < 15cm X 15cm)
3. Procedure : PR coating → Photo-lithography → Develop → Etch → Strip
  • image
Dry Etch System
Reactive Ion Etching (RIE)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
  • image
Wet Etch System
Wet station
 
Metal : Cu, Ti, Mo, Al, IZO, ITO
Insulator : SiO2, SiNx
Semiconductor : a-Si:H, LTPS, IGZO
 
Substrate size : < 15cm X 15cm
  • image
Baking System
Soft and Hard bakes for Photo-resist or solution process

Oven type

Company : Clean Oven
Model. No. : OF-11s

Soft baker : 110℃
Hard baker : 130℃
차세대 디스플레이 연구센터 (ADRC)
서울특별시 동대문구 경희대로 26 경희대학교 푸른솔 문화관 129호
TEL. 02-961-0607,0688  |  개인정보관리책임자 : ADRC 공정조교  |  E-mail : adrc2000@tft.khu.ac.kr
Copyright 2017 ⓒ ADRC Co., Ltd. All Rights Reserved. Design by Bizvalley.